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Editor-in-Chief

Mee-Yi Ryu orcid orcid Kangwon National University Republic of Korea

Vice-Editor-in-Chief

Jong Su Kim Yeungnam University Republic of Korea
Hong Seok Lee orcid orcid Jeonbuk National University Republic of Korea
Young-Jun Yu orcid Chungnam National University Republic of Korea

Vacuum Technology

Ju-Young Yun Korea Research Institute of Standards and Science Republic of Korea
Taekyun Ha orcid Pohang Accelerator Laboratory Republic of Korea
Karl Jousten orcid Physikalisch-Technische Bundesansalt Germany

Surface and Interface Science

Martin Ntwaeaborwa University of the Witwatersrand Johannesburg South Africa
Sang Wan Cho orcid orcid Yonsei University Republic of Korea
Soohyung Park orcid orcid Korea Institute of Science and Technology Republic of Korea
Kwun-Bum Chung Dongguk University Republic of Korea

Plasma and Display

Sooseok Choi orcid orcid Jeju National University Republic of Korea
ShinJae You orcid Chungnam National University Republic of Korea
Kyongnam Kim orcid orcid Daejeon University Republic of Korea
Dong Hun Shin orcid Korea Institute of Fusion Energy Republic of Korea
Seunghun Lee orcid orcid Korea Institute of Materials Science Republic of Korea
Andreas Pflug Fraunhofer Institute for Surface Engineering and Thin Films IST Germany
Yi-Kang Pu orcid Tsinghua University China
Hidemasa Takana orcid Tohoku University Japan

Semiconductors and Thin Films

Teresa Oh orcid Cheongju University Republic of Korea
Ki Kang Kim orcid Sungkyunkwan University Republic of Korea
Dong-Wook Kim orcid orcid Ewha Womans University Republic of Korea
Hyo Jung Kim orcid Pusan National University Republic of Korea
Jin Dong Song orcid orcid Korea Institute of Science and Technology Republic of Korea
Kyoung-Duck Park orcid orcid Pohang University of Science and Technology Republic of Korea
Min-Kyu Joo orcid Sookmyung Women's University Republic of Korea
Minh Tan Man orcid Duy Tan University Vietnam
Vasily Kravtsov orcid ITMO University Russia
Christoforos Theodorou orcid Grenoble Alps University France
Im Sik Han orcid University of Sheffield England
Soaram Kim orcid University of Maryland United States of America

Nano Science and Biointerface

Do Kyung Hwang orcid Korea Institute of Science and Technology Republic of Korea
So-Hye Cho orcid Korea Institute of Science and Technology Republic of Korea
Soo Min Kim Sookmyung Women's University Republic of Korea
Chang-Hee Cho orcid Daegu Gyeongbuk Institute of Science and Technology Republic of Korea
Cesar D. Fermin Tuskegee University United States of America

Energy Technology

Sanggyu Yim orcid Kookmin University Republic of Korea
Hyesung Park orcid orcid Ulsan National Institute of Science and Technology Republic of Korea
Chang-Lyoul Lee orcid Gwangju Institute of Science and Technology Republic of Korea
Joon Dong Kim orcid Incheon National University Republic of Korea

Managing Editor

Gaeul Jo The Korean Vacuum Society Republic of Korea

English Correction

Editage by CACTUS

JATS XML File Producers

Bae Go un Inforang Republic of Korea
Chae Eunseok Inforang Republic of Korea

Journal information

November, 2022, Vol.31 No 6

Most Cited

Characterization of SiO2 Over Poly-Si Mask Etching in Ar/C4F8 Capacitively Coupled Plasma

In Ho Seong , Jang Jae Lee , Chul Hee Cho , Yeong Seok Lee, Si Jun Kim , and Shin Jae You
ASCT 2021; 30(6): 176-182 more

Micro-Electromechanical Systems-based Sensors and Their Applications

Sophia Nazir and Oh Seok Kwon
ASCT 2022; 31(2): 40-45 more

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