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Journal information

September, 2023, Vol.32 No 5

Most Cited more +

Characterization of SiO2 Over Poly-Si Mask Etching in Ar/C4F8 Capacitively Coupled Plasma

In Ho Seong , Jang Jae Lee , Chul Hee Cho , Yeong Seok Lee, Si Jun Kim , and Shin Jae You

ASCT 2021; 30(6): 176-182

Micro-Electromechanical Systems-based Sensors and Their Applications

Sophia Nazir and Oh Seok Kwon

ASCT 2022; 31(2): 40-45

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