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Journal information

March, 2023, Vol.32 No 2

Most Cited

Characterization of SiO2 Over Poly-Si Mask Etching in Ar/C4F8 Capacitively Coupled Plasma

In Ho Seong , Jang Jae Lee , Chul Hee Cho , Yeong Seok Lee, Si Jun Kim , and Shin Jae You
ASCT 2021; 30(6): 176-182 more

Micro-Electromechanical Systems-based Sensors and Their Applications

Sophia Nazir and Oh Seok Kwon
ASCT 2022; 31(2): 40-45 more

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