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Aims and Scope

Aims and Scope

Applied Science and Convergence Technology (Appl. Sci. Converg. Technol., ASCT; e-ISSN 2288-6559) is a bimonthly published international peer-reviewed online journal. It aims to enhance the knowledge of applied science and technologies and vacuum by providing the researchers with easily accessible research information via the web. ASCT is concerned not only at scientists and researchers in the fields it covers but also at those in other fields who are interested in the following fields.

  • Vacuum technology
  • Surface and interface science
  • Plasma and display
  • Semiconductors and thin films
  • Nano science and biointerface
  • Energy technology

General Information

The Korean Vacuum Society launched its official journal in 1992 under the name of Journal of the Korean Vacuum Society (JKVS; p-ISSN 1225-8822) as a quarterly journal, and it has been published in bimonthly since 2006. ASCT has succeeded JKVS as an online journal since 2014 and published 6 times a year (January 30, March 30, May 30, July 30, September 30, November 30). ASCT pursues its advancement through the research paper, review paper, rapid communications, brief reports, and technical papers.
ASCT is indexed in SCOPUS, ESCI, DOI/Crossref, Google Scholar; Science Central, an archive of scientific society journal literatures at the Korean Federation of Science and Technology Societies (KOFST); Korea Science, the open platform for Korean scholarly publications of the Korea Institute of Science and Technology Information (KISTI); and the Korea Citation Index (KCI), an academic database of National Research Foundation of Korea . It also has been listed in the “Excellent Accredited Journal” since 2017, where only a few of the best journals in KCI are selected.

Abstracting and Indexing

Applied Science and Convergence Technology (Appl. Sci. Converg. Technol., ASCT; e-ISSN 2288-6559) is currently abstracted and indexed in SCOPUS and KCI (Korea Journal Citation Index) ESCI (Emerging Sources Citation Index).
- SCOPUS : www.scopus.com
- KCI : www.kci.go.kr
- ESCI : mjl.clarivate.com

Journal information

November, 2022, Vol.31 No 6

Most Cited

Characterization of SiO2 Over Poly-Si Mask Etching in Ar/C4F8 Capacitively Coupled Plasma

In Ho Seong , Jang Jae Lee , Chul Hee Cho , Yeong Seok Lee, Si Jun Kim , and Shin Jae You
ASCT 2021; 30(6): 176-182 more

Micro-Electromechanical Systems-based Sensors and Their Applications

Sophia Nazir and Oh Seok Kwon
ASCT 2022; 31(2): 40-45 more

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