eISSN 2288-6559
Download to citation(s)
Park M, Yoon I, , Park Y.  Etching for Vertical Sidewall Formation in TiO<sub>2</sub> Nanorods.  Applied Science and Convergence Technology 2022;31:113-115.  
https://doi.org/10.5757/ASCT.2022.31.5.113
Export type

* Please select a format and type blew.

Format