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Kim C, Lee S, Kim M, Choi MS, Kim T, , Kim HU.  Machine Learning-Based Prediction of Atomic Layer Control for MoS<sub>2</sub> via Reactive Ion Etcher.  Applied Science and Convergence Technology 2023;32:106-109.  
https://doi.org/10.5757/ASCT.2023.32.5.106
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