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Lee SB, Kim JH, Kim G, Park JW, Chae BK, , Choe* HH.  Deep Learning Predicts Ar/O<sub>2</sub> Plasma in Inductively Coupled Plasma Discharge.  Applied Science and Convergence Technology 2023;32:122-126.  
https://doi.org/10.5757/ASCT.2023.32.5.122
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