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Park W, Park S, , Moon SY, * .  Effects of Chamber Wall Contamination Levels on Plasma Properties in Long-Term C<sub>4</sub>F<sub>8</sub>/Ar Plasma Deposition Processes.  Applied Science and Convergence Technology 2024;33:160-163.  
https://doi.org/10.5757/ASCT.2024.33.6.160
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