eISSN 2288-6559
Download to citation(s)
Lee SK, Kim JH, Choi DH, Hwang MW, Um MY, Kim YH, Kim JY, Kim HJ.  Deposition mechanism of Bi₄Ti₃O₁₂ films on Si by MOCVD and property improvement by pulse injection method.  Applied Science and Convergence Technology 2000;9:373-378.  
Export type

* Please select a format and type blew.