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Cited by CrossRef (10)

  1. Youngseok Lee, Heejung Yeom, Daehan Choi, Sijun Kim, Jangjae Lee, Junghyung Kim, Hyochang Lee, ShinJae You. Database Development of SiO2 Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe. Nanomaterials 2022;12:3828
    https://doi.org/10.3390/nano12213828
  2. Minsu Choi, Youngseok Lee, Yebin You, Chulhee Cho, Wonnyoung Jeong, Inho Seong, Byeongyeop Choi, Sijun Kim, Youbin Seol, Shinjae You, Geun Young Yeom. Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the Greenhouse Gas Emissions Reduction. Materials 2023;16:5624
    https://doi.org/10.3390/ma16165624
  3. Youngseok Lee, Yebin You, Chulhee Cho, Sijun Kim, Jangjae Lee, Minyoung Kim, Hanglim Lee, ShinJae You. Plasma Treatment Mechanism in Si–SiO2 Direct Wafer Bonding. sci adv mater 2022;14:1265
    https://doi.org/10.1166/sam.2022.4313
  4. Chulhee Cho, Sijun Kim, Youngseok Lee, Inho Seong, Wonnyoung Jeong, Yebin You, Minsu Choi, Shinjae You. Determination of Plasma Potential Using an Emissive Probe with Floating Potential Method. Materials 2023;16:2762
    https://doi.org/10.3390/ma16072762
  5. Inho Seong, Sijun Kim, Minsu Choi, Woobeen Lee, Wonnyoung Jeong, Chulhee Cho, Yebin You, Youngseok Lee, Youbin Seol, Shinjae You. Enhancement of Ar Ion Flux on the Substrate by Heterogeneous Charge Transfer Collision of Ar Atom with He Ion in an Inductively Coupled Ar/He Plasma. Materials 2023;16:5746
    https://doi.org/10.3390/ma16175746
  6. Youngseok Lee, Sijun Kim, Jangjae Lee, Chulhee Cho, Inho Seong, Shinjae You. Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO2. Sensors 2022;22:6029
    https://doi.org/10.3390/s22166029
  7. Youngseok Lee, Yebin You, Chulhee Cho, Sijun Kim, Jangjae Lee, Minyoung Kim, Hanglim Lee, Youngjun You, Kyungman Kim, ShinJae You. Comprehensive Assessments in Bonding Energy of Plasma Assisted Si-SiO2 Direct Wafer Bonding after Low Temperature Rapid Thermal Annealing. Micromachines 2022;13:1856
    https://doi.org/10.3390/mi13111856
  8. Wonnyoung Jeong, Sijun Kim, Youngseok Lee, Chulhee Cho, Inho Seong, Yebin You, Minsu Choi, Jangjae Lee, Youbin Seol, Shinjae You. Contribution of Ion Energy and Flux on High-Aspect Ratio SiO2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C4F8 Plasma: Individual Ion Energy and Flux Controlled. Materials 2023;16:3820
    https://doi.org/10.3390/ma16103820
  9. Chulhee Cho, Sijun Kim, Youngseok Lee, Wonnyoung Jeong, Inho Seong, Jangjae Lee, Minsu Choi, Yebin You, Sangho Lee, Jinho Lee, Shinjae You. Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma. Sensors 2022;22:6589
    https://doi.org/10.3390/s22176589
  10. Miyako Hada, Motonobu Takahashi, Yuhei Sakaguchi, Tetsuo Fujii, Masakazu Minami. Chamber in-situ estimation during etching process by SiF4 monitoring using laser absorption spectroscopy. Jpn. J. Appl. Phys. 2023;62:SI1013
    https://doi.org/10.35848/1347-4065/accc95