Cited by CrossRef (12)
- Youngseok Lee, Heejung Yeom, Daehan Choi, Sijun Kim, Jangjae Lee, Junghyung Kim, Hyochang Lee, ShinJae You. Database Development of SiO2 Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe. Nanomaterials 2022;12:3828

- Minsu Choi, Youngseok Lee, Yebin You, Chulhee Cho, Wonnyoung Jeong, Inho Seong, Byeongyeop Choi, Sijun Kim, Youbin Seol, Shinjae You, Geun Young Yeom. Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the Greenhouse Gas Emissions Reduction. Materials 2023;16:5624

- Youngseok Lee, Yebin You, Chulhee Cho, Sijun Kim, Jangjae Lee, Minyoung Kim, Hanglim Lee, ShinJae You. Plasma Treatment Mechanism in Si–SiO2 Direct Wafer Bonding. sci adv mater 2022;14:1265

- Chulhee Cho, Sijun Kim, Youngseok Lee, Inho Seong, Wonnyoung Jeong, Yebin You, Minsu Choi, Shinjae You. Determination of Plasma Potential Using an Emissive Probe with Floating Potential Method. Materials 2023;16:2762

- Inho Seong, Sijun Kim, Minsu Choi, Woobeen Lee, Wonnyoung Jeong, Chulhee Cho, Yebin You, Youngseok Lee, Youbin Seol, Shinjae You. Enhancement of Ar Ion Flux on the Substrate by Heterogeneous Charge Transfer Collision of Ar Atom with He Ion in an Inductively Coupled Ar/He Plasma. Materials 2023;16:5746

- Youngseok Lee, Sijun Kim, Jangjae Lee, Chulhee Cho, Inho Seong, Shinjae You. Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO2. Sensors 2022;22:6029

- Youngseok Lee, Yebin You, Chulhee Cho, Sijun Kim, Jangjae Lee, Minyoung Kim, Hanglim Lee, Youngjun You, Kyungman Kim, ShinJae You. Comprehensive Assessments in Bonding Energy of Plasma Assisted Si-SiO2 Direct Wafer Bonding after Low Temperature Rapid Thermal Annealing. Micromachines 2022;13:1856

- Minsu Choi, Youngseok Lee, Chulhee Cho, Wonnyoung Jeong, Inho Seong, Jami Md Ehsanul Haque, Byeongyeop Choi, Seonghyun Seo, Sijun Kim, Shinjae You, Geun Young Yeom. Plasma Dielectric Etching with C4H2F6 Isomers of Low Global-Warming Potential. JMMP 2025;9:42

- Wonnyoung Jeong, Sijun Kim, Youngseok Lee, Chulhee Cho, Inho Seong, Yebin You, Minsu Choi, Jangjae Lee, Youbin Seol, Shinjae You. Contribution of Ion Energy and Flux on High-Aspect Ratio SiO2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C4F8 Plasma: Individual Ion Energy and Flux Controlled. Materials 2023;16:3820

- Haruhiko Himura, Takashi Kanki, Subaru Nishio, Akio Sanpei. Extraction of light ion beams through a compact separator. Vacuum 2025;234:114015

- Chulhee Cho, Sijun Kim, Youngseok Lee, Wonnyoung Jeong, Inho Seong, Jangjae Lee, Minsu Choi, Yebin You, Sangho Lee, Jinho Lee, Shinjae You. Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma. Sensors 2022;22:6589

- Miyako Hada, Motonobu Takahashi, Yuhei Sakaguchi, Tetsuo Fujii, Masakazu Minami. Chamber in-situ estimation during etching process by SiF4 monitoring using laser absorption spectroscopy. Jpn. J. Appl. Phys. 2023;62:SI1013
