eISSN 2288-6559

Cited by CrossRef (16)

  1. Si-jun Kim, Jang-jae Lee, Young-seok Lee, Chul-hee Cho, Shin-jae You. Crossing Frequency Method Applicable to Intermediate Pressure Plasma Diagnostics Using the Cutoff Probe. Sensors 2022;22:1291
  2. Youngseok Lee, Heejung Yeom, Daehan Choi, Sijun Kim, Jangjae Lee, Junghyung Kim, Hyochang Lee, ShinJae You. Database Development of SiO2 Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe. Nanomaterials 2022;12:3828
  3. Si-Jun Kim, Min-Su Choi, Sang-Ho Lee, Won-Nyoung Jeong, Young-Seok Lee, In-Ho Seong, Chul-Hee Cho, Dae-Woong Kim, Shin-Jae You. Development of the Tele-Measurement of Plasma Uniformity via Surface Wave Information (TUSI) Probe for Non-Invasive In-Situ Monitoring of Electron Density Uniformity in Plasma Display Fabrication Process. Sensors 2023;23:2521
  4. Minsu Choi, Youngseok Lee, Yebin You, Chulhee Cho, Wonnyoung Jeong, Inho Seong, Byeongyeop Choi, Sijun Kim, Youbin Seol, Shinjae You, Geun Young Yeom. Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the Greenhouse Gas Emissions Reduction. Materials 2023;16:5624
  5. Chulhee Cho, Sijun Kim, Youngseok Lee, Inho Seong, Wonnyoung Jeong, Yebin You, Minsu Choi, Shinjae You. Determination of Plasma Potential Using an Emissive Probe with Floating Potential Method. Materials 2023;16:2762
  6. Inho Seong, Si-jun Kim, Youngseok Lee, Chulhee Cho, Wonnyoung Jeong, Yebin You, Minsu Choi, Byeongyeop Choi, Shinjae You. On the Quenching of Electron Temperature in Inductively Coupled Plasma. Materials 2023;16:3219
  7. Chulhee Cho, Sijun Kim, Youngseok Lee, Wonnyoung Jeong, Inho Seong, Jangjae Lee, Minsu Choi, Yebin You, Sangho Lee, Jinho Lee, Shinjae You. Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma. Sensors 2022;22:6589
  8. Si-jun Kim, In-ho Seong, Young-seok Lee, Chul-hee Cho, Won-nyoung Jeong, Ye-bin You, Jang-jae Lee, Shin-jae You. Development of a High-Linearity Voltage and Current Probe with a Floating Toroidal Coil: Principle, Demonstration, Design Optimization, and Evaluation. Sensors 2022;22:5871
  9. Wonnyoung Jeong, Sijun Kim, Youngseok Lee, Chulhee Cho, Inho Seong, Yebin You, Minsu Choi, Jangjae Lee, Youbin Seol, Shinjae You. Contribution of Ion Energy and Flux on High-Aspect Ratio SiO2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C4F8 Plasma: Individual Ion Energy and Flux Controlled. Materials 2023;16:3820
  10. Youngseok Lee, Yebin You, Chulhee Cho, Sijun Kim, Jangjae Lee, Minyoung Kim, Hanglim Lee, ShinJae You. Plasma Treatment Mechanism in Si–SiO2 Direct Wafer Bonding. sci adv mater 2022;14:1265
  11. Jongho So, Minjoong Kim, Hyuksung Kwon, Seonjeong Maeng, Eunmi Choi, Chin-Wook Chung, Ju-Young Yun. Investigation of contamination particles generation and surface chemical reactions on Al2O3, Y2O3, and YF3 coatings in F-based plasma. Applied Surface Science 2023;629:157367
  12. Inho Seong, Sijun Kim, Youngseok Lee, Chulhee Cho, Jangjae Lee, Wonnyoung Jeong, Yebin You, Shinjae You. Development of a Noninvasive Real-Time Ion Energy Distribution Monitoring System Applicable to Collisional Plasma Sheath. Sensors 2022;22:6254
  13. Youngseok Lee, Yebin You, Chulhee Cho, Sijun Kim, Jangjae Lee, Minyoung Kim, Hanglim Lee, Youngjun You, Kyungman Kim, ShinJae You. Comprehensive Assessments in Bonding Energy of Plasma Assisted Si-SiO2 Direct Wafer Bonding after Low Temperature Rapid Thermal Annealing. Micromachines 2022;13:1856
  14. Youngseok Lee, Sijun Kim, Jangjae Lee, Chulhee Cho, Inho Seong, Shinjae You. Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO2. Sensors 2022;22:6029
  15. Si-jun Kim, Youngseok Lee, Chulhee Cho, Inho Seong, Wonnyoung Jeong, Jangjae Lee, Shinjae You. Analysis on crossing frequency in transmission microwave frequency spectrum of the cutoff probe. 2023;30
  16. Youbin Seol, Minsu Choi, Hongyoung Chang, Shinjae You. Study on OH Radical Production Depending on the Pulse Characteristics in an Atmospheric-Pressure Nanosecond-Pulsed Plasma Jet. Materials 2023;16:3846