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Seong IH, Lee JJ, Cho CH, Lee YS, Kim SJ, , You SJ.  Characterization of SiO<sub>2</sub> Over Poly-Si Mask Etching in Ar/C<sub>4</sub>F<sub>8</sub> Capacitively Coupled Plasma.  Applied Science and Convergence Technology 2021;30:176-182.  https://doi.org/10.5757/ASCT.2021.30.6.176