eISSN 2288-6559
E-mail a Link to a Someone Who you'd like to recommend.
E-mail a link to the following content:
Choi IS, Lee BT, Kim DK, Park JS.  Reactive ion etching of InP using Cl₂ / CH₄ / H₂ discharges.  Applied Science and Convergence Technology 1997;6:282-286.