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January, 2024, Vol.33 No 1
In this study, we investigated the effect of O2 plasma on both the structural and electrical characteristics of graphene under remote and reactive ion etching (RIE) plasma treatments. Electrical properties and Raman spectra of the plasma treated graphene reveal p-doping effects with RIE mode, which is identified as the optimal mode for enhancing graphene properties without compromising its bonding network integrity. The study also confirms the partial restoration of the plasma-treated graphene achieved through heat treatment.
Articles
< PreviousApplied Science and Convergence Technology 2024; 33(1): 1~35Next >
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Atomic Layer Etching of SiO2 for Nanoscale Semiconductor Devices: A Review
Daeun Hong
, Yongjae Kim , and Heeyeop Chae
aSchool of Chemical Engineering, Sungkyunkwan University, Suwon 16419, Republic of Korea
bSKKU Advanced Institute of Nano Technology (SAINT), Sungkyunkwan University, Suwon 16419, Republic of Korea
cDepartment of Semiconductor Convergence Engineering, Sungkyunkwan University, Suwon 16419, Republic of Korea ASCT 2024; 33(1): 1-6 Keywords : Anisotropic etching, Atomic layer etching, Isotropic etching, Silicon oxide -
Investigating the Impact of Oxygen Surface Plasma Treatments on the Structural and Electrical Properties of Graphene
Wonseop Lee , Seongho Kim , Taehwan Lee , Yoona Hwang , Sungbin Lee , Yasir Hassan , Anh Vo Hoang , Eui-Tae Kim , and Min Sup Choi
Department of Materials Science and Engineering, Chungnam National University, Daejeon 34134, Republic of Korea
ASCT 2024; 33(1): 7-12
Keywords : Two-dimensional material, Graphene, Transfer process, O2 plasma, Raman spectroscopy, Electrical properties, Dirac point, p-type doping
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Study on the Value-Added Carbon Products from Methane Pyrolysis with the Thermal Plasma Process
Hyeokjun Kang , Jeong-Hwan Oh , Yong Hee Lee , Subin Yang , and Sooseok Choi
aFaculty of Applied Energy System, Jeju National University, Jeju 63243, Republic of Korea
bElectric Energy Research Center, Jeju National University, Jeju 63243, Republic of Korea
cDepartment of Nuclear and Energy Engineering, Jeju National University, Jeju 63243, Republic of Korea ASCT 2024; 33(1): 13-17 Keywords : Thermal plasma, Methane, Carbon black, Annealing, Lithium-ion battery -
Uniformity and Thickness Control of MoS2 During Thermolysis
Gyeong Ryul Lee , Cheolho Yang , and Roy Byung Kyu Chung
School of Materials Science and Engineering, Kyungpook National University, Daegu 41566, Republic of Korea
ASCT 2024; 33(1): 18-22
Keywords : MoS2, Thermolysis, Large scale, Uniformity
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Effect of δ-CsPbI3 Phase Separation in CsxFA1−xPbI3 under Ambient Conditions
Muntae Hwang , Jaewon Oh , Hyunbok Lee , and Mee-Yi Ryu
Department of Physics and Institute of Quantum Convergence Technology, Kangwon National University, Chuncheon 24341, Republic of Korea
ASCT 2024; 33(1): 23-26
Keywords : Cesium, Formamidinium, Mixed-cation, Perovskite, Photovoltaic
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Etch Damage of SiOC Thin Films in an Inductively Coupled Plasma Using Low-Frequency
Jinhyuk Kim , Gilyoung Choi , and Daekug Lee
aDepartment of Control and Instrumentation Engineering, Korea University, Sejong 30019, Republic of Korea
bDepartment of Computer and Information Science, Korea University, Sejong 30019, Republic of Korea ASCT 2024; 33(1): 27-31 Keywords : Silicon oxycarbide, Dielectric constant, Fourier-transform infrared plasma etching damage, Surface characteristics -
Characteristics of a Plasmonic Color Filter Using Simple Focused Ion Beam Process
Taehun Kim , Byungwoo Lee , and Ha Sul Kim
aNational Forensic Service, Wonju 26460, Republic of Korea
bDepartment of Physics, Chonnam National University, Kwangju 61748, Republic of Korea ASCT 2024; 33(1): 32-35 Keywords : Plasmon, Plasmonic color filter, International commission on illumination chromaticity
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