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Applied Science and Convergence Technology
ESCI
eISSN 2288-6559
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September, 2023, Vol.32 No 5

This study investigates MoS2 plasma etching, a key process in semiconductor manufacturing, using an ICP-RIE system and machine learning to accurately predict post-etch thickness. The results, validated by Raman spectroscopy and XPS, underscore the synergy between AI and experimental methods in advancing semiconductor techniques.

Articles

< PreviousApplied Science and Convergence Technology 2023; 32(5): 101~133Next >

  • Dielectric Characteristics of BaTiO3 Solid Solution Substituted with Nb5+, Ta5+, Bi3+, and Sb3+ Ions

    Yeon Jung Kim College of Engineering, Dankook University, Yongin 16890, Republic of Korea ASCT 2023; 32(5): 101-105 Keywords : BaTiO3, Pb(Mg1/3Nb2/3)O3, Dopants substitution, Ferroelectrics, Modified Curie-Weiss law

  • Machine Learning-Based Prediction of Atomic Layer Control for MoS2 via Reactive Ion Etcher

    Changmin Kim , Seunghwan Lee , Muyoung Kim , Min Sup Choi , Taesung Kim , and Hyeong-U Kim aDepartment of Plasma Engineering, Korea Institute of Machinery and Materials, Daejeon 34103, Republic of Korea
    bSchool of Mechanical Engineering, Sungkyunkwan University, Suwon 16419, Republic of Korea
    cDepartment of Materials Science and Engineering, Chungnam National University, Daejeon 34134, Republic of Korea
    dSKKU Advanced Institute of Nanotechnology, Sungkyunkwan University, Suwon 16419, Republic of Korea     ASCT 2023; 32(5): 106-109 Keywords : Plasma, Machine learning, Layer control, MoS2, Reactive ion etching

  • Enhancement of Light-Harvesting Ability on Perovskite Films via Preheated Substrates

    Jaewon Oh , Hyunbok Lee , and Mee-Yi Ryu Department of Physics, Kangwon National University, Chuncheon 24341, Republic of Korea ASCT 2023; 32(5): 110-113 Keywords : Perovskite, Preheating, Photovoltaic, Light-harvesting

  • Analysis of the Characteristics of Radio Frequency Power Transmission Lines Using a Voltage Current Probe in Low-Pressure Discharge

    Chan-Won Park , Hee-Jung Yeom , Hyo-Chang Lee , and Jung-Hyung Kim aSemiconductor Integrated Metrology Team, Korea Research Institute of Standards and Science, Daejeon 34113, Republic of Korea
    bDepartment of Physics, Chungnam National University, Daejeon 34134, Republic of Korea
    cSchool of Electronics and Information Engineering, Korea Aerospace University, Goyang 10540, Republic of Korea
    dDepartment of Semiconductor Science, Engineering and Technology, Korea Aerospace University, Goyang 10540, Republic of Korea     ASCT 2023; 32(5): 118-121 Keywords : Voltage current probe, Radio frequency power transmission line

  • Spectroscopic Analysis of Effects of Additive Nitrogen on Atmospheric Pressure Ar/HMDS Plasma

    Jonggu Han , Rodolphe Mauchauffé , and Se Youn Moon aDepartment of Applied Plasma and Quantum Beam Engineering, Jeonbuk National University, Jeonju 54896, Republic of Korea
    bMaterials Research and Technology Department, Luxembourg Institute of Science and Technology, Esch-sur-Alzette L-4362, Luxembourg
    cDepartment of Quantum System Engineering, Jeonbuk National University, Jeonju 54896, Republic of Korea
    dHigh-Enthalpy Plasma Research Center, Jeonbuk National University, Wanju 55317, Republic of Korea     ASCT 2023; 32(5): 114-117 Keywords : Hexamethyldisilazane, Plasma enhanced chemical vapor deposition, Nitrogen plasma, Synthetic spectra, Optical emission spectroscopy

  • Deep Learning Predicts Ar/O2 Plasma in Inductively Coupled Plasma Discharge

    Sang-Bin Lee , Ji-Hoon Kim , Gwan Kim , Jun-Woo Park , Byung-Kwan Chae , and Hee-Hwan Choe * School of Electronics and Information Engineering, Korea Aerospace University, Goyang 10540, Republic of Korea ASCT 2023; 32(5): 122-126 Keywords : Deep learning, Plasma simulation, Interpolation, Extrapolation, Plasma process

  • Computational Study on the Parallel Double-Curling Probe for Multi-Site Electron Density Measurement in Low-Temperature Plasma

    Si-Jun Kim , Won-Nyoung Jeong , Young-Seok Lee , You-Bin Seol , Chul-Hee Cho , In-Ho Seong , Min-Su Choi , and Shin-Jae You aApplied Physics lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University, Daejeon 34134, Republic of Korea
    bInstitute of Quantum Systems (IQS), Chungnam National University, Daejeon 34134, Republic of Korea     ASCT 2023; 32(5): 127-133 Keywords : Plasma diagnostics, Electron density measurement, Multi-site electron density measurement, Curling probe, Double-curling probe, Parallel double-curling probe, three-dimensional electromagnetic wave simulations

Journal information

July, 2024, Vol.33 No 4
eISSN 2288-6559
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