eISSN 2288-6559
Fig. 6.
Fig. 6. Total etch depth and EPC, measured as a function of the number of cycles by using physical (O/Cl radical adsorption and Ar+ ion desorption) Cr ALE and chemical (O radical adsorption and Cl+ ion desorption) Cr ALE. Reproduced with permission from [28], Copyright 2018, IOP Publishing.
Applied Science and Convergence Technology 2020;29:41~49
© Appl. Sci. Converg. Technol.

Copyright © The Korean Vacuum Society. All Rights Reserved. / Powered by INFOrang Co., Ltd