Fig. 6. Scanning electron microscopy (SEM) images of the surface of (a) bare SiO2/Si wafer, (b) as-deposited MoS2 film, and (c) EBI-treated MoS2 film. (d) Cross-sectional transmission electron microscopy (TEM) image of EBI-treated MoS2 film. Scale bars in SEM and TEM images represent 100 and 5 nm, respectively.
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