Fig. 15. (a) UV absorption profile caused by the OH radical species (black) versus the wavelengths. Reference UV lamp profile (I_o ) versus the wavelength without nonthermal atmospheric pressure plasma jet (red). Emission profiles from the plasma versus the wavelength from hydroxyl OH radical species (blue) without UV incidence. (b) Hydroxyl OH radical density at the region of 2 mm above the interfacial surface, versus the Ar gas flow rate ranged from 80 to 240 sccm. Reproduced with permission from [104], Copyright 2012, IOP Science.

Applied Science and Convergence Technology 2021;30:118~136 https://doi.org/10.5757/ASCT.2021.30.5.118

© Appl. Sci. Converg. Technol.