eISSN 2288-6559
Fig. 9.
Etch rate and selectivity as a function of the critical value, n
e
V
bias
, for different (a) power levels, (b) pressure levels, and (c) gas ratios.
Applied Science and Convergence Technology 2021;30:176~182
https://doi.org/10.5757/ASCT.2021.30.6.176
© Appl. Sci. Converg. Technol.
© The Korean Vacuum Society. All Rights Reserved. / Powered by INFOrang Co., Ltd