Fig. 1. (a) Schematic illustration of TiO₂ deposition process with RF reactive magnetron sputtering system. (b) Transmittance spectra of spin-coated TiO₂ (black solid line), RFRS TiO₂ (red solid line), and RFRS TiO₂ after annealing for 1 h at 450 °C (red dashed line).

Applied Science and Convergence Technology 2022;31:116~119 https://doi.org/10.5757/ASCT.2022.31.5.116

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