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Fig. 1.
Fig. 1. (a) Schematic illustration of TiO2 deposition process with RF reactive magnetron sputtering system. (b) Transmittance spectra of spin-coated TiO2 (black solid line), RFRS TiO2 (red solid line), and RFRS TiO2 after annealing for 1 h at 450 °C (red dashed line).
Applied Science and Convergence Technology 2022;31:116~119 https://doi.org/10.5757/ASCT.2022.31.5.116
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