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Fig. 2.
Fig. 2. (a) Cross-sectional scanning electron microscopy (SEM) images of TiO2 structures etched by Ar/Cl2 gas mixture with 0:0, 10:30, 20:20, and 30:10 sccm (Ar percentage of 0, 25, 50, and 75 % to Cl2). The etching time corresponds to 2 min in all cases. (b) Etching rate graph drawn in the function of Ar addition ratio to Cl2.
Applied Science and Convergence Technology 2022;31:113~115 https://doi.org/10.5757/ASCT.2022.31.5.113
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