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Fig. 3.
Fig. 3. (a) Cross-sectional SEM images of TiO2 structures etched by Ar/BCl3 gas mixture with 10:30 and 20:20 sccm (Ar percentage of 25 and 50 % to BCl3). The etching time corresponds to 2 min in all cases. (b) Etching rate graph drawn in the function of Ar addition ratio to BCl3.
Applied Science and Convergence Technology 2022;31:113~115 https://doi.org/10.5757/ASCT.2022.31.5.113
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