eISSN 2288-6559
Fig. 3.
Fig. 3. (a) Cross-sectional SEM images of TiO2 structures etched by Ar/BCl3 gas mixture with 10:30 and 20:20 sccm (Ar percentage of 25 and 50 % to BCl3). The etching time corresponds to 2 min in all cases. (b) Etching rate graph drawn in the function of Ar addition ratio to BCl3.
Applied Science and Convergence Technology 2022;31:113~115
© Appl. Sci. Converg. Technol.

© The Korean Vacuum Society. All Rights Reserved. / Powered by INFOrang Co., Ltd