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Fig. 4.
Fig. 4. (a) Cross-sectional SEM images of TiO2 structures etched by HBr/Ar/Cl2 combination with 1:4:4 ratio. (b) SEM images of TiO2 nanorods with vertical sidewall with 465-nm period. These were etched with HBr/Ar/BCl3 combination.
Applied Science and Convergence Technology 2022;31:113~115 https://doi.org/10.5757/ASCT.2022.31.5.113
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