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Fig. 3.
Fig. 3. (a) Electron density with increasing ICP power in a Ar/C4F6 mixture. (b) Residence time with increasing total flow rate for 10 and 50 mTorr. Reproduced with permission from [4], Copyright 2021, American Institute of Physics.
Applied Science and Convergence Technology 2023;32:34~37 https://doi.org/10.5757/ASCT.2023.32.2.34
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