eISSN 2288-6559
Fig. 1.
Fig. 1.
ML sequence for prediction of atomic thickness by plasma etching process.
Applied Science and Convergence Technology 2023;32:106~109
https://doi.org/10.5757/ASCT.2023.32.5.106
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eISSN 2288-6559
eISSN 2288-6559
