Fig. 5. (a) Area % of Si-O/C-O and (b) ion and UV effects according to optical mask and Ar fraction in Ar + He + CF₄ plasma.

Applied Science and Convergence Technology 2024;33:27~31 https://doi.org/10.5757/ASCT.2024.33.1.27

© Appl. Sci. Converg. Technol.