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Applied Science and Convergence Technology 2009; 18(6): 403-410

Published online November 1, 2009

Copyright © The Korean Vacuum Society.

A Study of Non-uniform Pressure Distribution in Vacuum Chamber during Dynamic Gas Flow

Wakil Khan,K. S. Hong,S. S. Hong

Abstract

Vacuum chambers have wide application for a variety of purposes such as material processing, vacuum gauge calibration, etc. As the dynamic pressure generated in such chamber is non-uniform, in many industrial as well as research processes, it is vital to know the non-uniform gas distribution with associated gas flow regimes and the ways of minimizing these pressure non-uniformities. In the present work, the behavior of gas flow in a vacuum chamber, during continuous gas flow, is described in the pressure range 0.1-133 Pa and the effect of baffle plate in minimizing the pressure non-uniformities is investigated. It was observed that maximum deviations in the pressure occur near the gas inlet point and that the effect of baffle plate in minimizing the pressure non-uniformities is more obvious in the transitional flow regime.

Keywords: Vacuum chamber,Dynamic gas flow,Baffle plate,CDGs,진공 용기,동적 기체 흐름,배플판,용량형 진공게이지

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