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Applied Science and Convergence Technology

Published online August 25, 2023

Copyright © The Korean Vacuum Society.

Spectroscopic analysis of additive nitrogen effects on atmospheric pressure Ar/HMDS plasma

Jonggu Han , Rodolphe Mauchauffé , Se youn Moon *

1Department of Applied Plasma and Quantum Beam Engineering, Jeonbuk National University, 2Materials Research and Technology Department, Luxembourg Institute of Science and Technology, 3Department of Quantum System Engineering, Jeonbuk National University, 4High-enthalpy Plasma Research Center, Jeonbuk National University

Correspondence to:symoon@jbnu.ac.kr

Received: June 12, 2023; Revised: August 16, 2023; Accepted: August 25, 2023


Hexamethyldisilazane (HMDS) is one of the cost-effective and stable compounds used for the synthesis of thin films for numerous applications such as silicon nitride thin film deposition. In order to deposit thin films from HMDS, plasma enhanced chemical vapor deposition (PECVD) is commonly used, because the plasma can offer enough energy to effectively decompose the HMDS and leads to the formation of films. In addition, with HMDS, various gases have been added to the plasma to modulate the plasma characteristics. In this study, the influence of the addition of nitrogen in an atmospheric pressure Ar/HMDS plasma was investigated. Optical emission spectroscopy measurements provided valuable insights into the characteristics of the plasma under different nitrogen gas flow rates and the importance of nitrogen as a deposition parameter was discussed. Consequently, the introduction of nitrogen in the Ar/HMDS plasma resulted in the decrease of various temperatures such as excitation, vibrational and rotational temperatures, which significantly changed the composition of reactive species in the plasma.

Keywords: Hexamethyldisilazane, plasma enhanced chemical vapor deposition, nitrogen plasma, synthetic spectra, optical emission spectroscopy

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