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Research Paper

Applied Science and Convergence Technology 2014; 23(4): 161-168

Published online July 30, 2014

Copyright © The Korean Vacuum Society.

Plasma Uniformity Analysis of Inductively Coupled Plasma Assisted
Magnetron Sputtering by a 2D Voltage Probe Array

Junghoon Joo*

Department of Materials Science & Engineering & Plasma Materials Research Center,
Kunsan National University

Correspondence to:Junghoon Joo*

Received: June 2, 2014; Revised: July 29, 2014; Accepted: July 30, 2014

Abstract

A real‐time monitoring of immersed antenna type inductively coupled plasma (ICP) was
done with a homemade 2 dimensional voltage probe array to check the uniformity of the
plasma. Measured voltage values with a high impedance voltmeter are close to the floating
potential of the plasma. As the substrate carrier was moving into a magnetron sputtering
plasma diffusive from a 125 mm×625 mm size cathode, measured results showed reliably
separation of plasma into the upper and lower empty space over the carrier. Infra red thermal
imaging camera was used to observe the cross corner effect in situ without eroding a target
to the end of the usage. 3 dimensional particle trace model was used to analyze the magnetron
discharge's behavior.

Keywords: Inductively coupled plasma, Sputtering, Voltage probe

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