Applied Science and Convergence Technology 2015; 24(5): 162-166
Published online September 30, 2015
Copyright © The Korean Vacuum Society.
Seunghun Lee and Do-Geun Kim*
Plasma Processing Laboratory, Division of Surface Technology, Korea Institute of Materials Science, Changwon 51508, Korea
Correspondence to:Do-Geun Kim
This is an Open Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/by-nc/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
Linear ion beams have been introduced for the ion beam treatments of flexible substrates in roll-to-roll web coating systems. Anode layer linear ion sources (300 mm width) were used to make the linear ion beams. Oxygen ion beams having an ion energy from 200 eV to 800 eV used for the adhesion improvement of Cu thin films on PET substrates. The Cu thin films deposited by a conventional magnetron sputtering on the oxygen ion beam treated PET substrates showed Class 5 adhesion defined by ASTM D3359-97 (tape test). Argon ion beams with 1∼3 keV used for the ion beam sputtering deposition process, which aims to control the initial layer before the magnetron sputtering deposition. When the discharge power of the linear ion source is 1.2 kW, static deposition rate of Cu and Ni were 7.4 and 3.5 Å/sec, respectively.
Keywords: Ion beam, Ion source, Sputtering, Surface treatment, Roll-to-roll