• Home
  • Sitemap
  • Contact us
Article View

Applied Science and Convergence Technology 1998; 7(1): 72-76

Published online February 1, 1998

Copyright © The Korean Vacuum Society.

Formation of the functional plasma polymerized thin films by a new type reactor

Jong-Taek Kim,Sang-Hee Lee,Jong-Kwan Park,Gu-Bum Park,Duck-Chool Lee

Abstract

A new gas-flow type reactor for plasma polymerization was developed to synthesize functional polymers, which enhances reaction of radicals activated in the discharge. Styrene was used for the plasma polymerization and molecular structure and molecular weight distribution of the plasma -polymerized styrene were studied. The polymer was evaluated to be an efficient electron beam resist. The sensitivity of the plasma-polymerized styrene film formed by this new reactor was better than that of the reported values of conventional polystyrene, Fine resist patterns could be successfully developed by a wet process.

Share this article on :

Stats or metrics