In this paper, the relationship of chamber contamination and the intensity change of specific wavelength was investigated. “diff_CO” formula was introduced to rule out background noise caused by external conditions and to detect when the polymer is removed from the chamber. As RF time increased, diff_CO trend showed the decrease of the maximum peak and increased number of small intensity peaks. From the diff_CO change, it was possible to determine when the chamber needs to be cleaned without opening the chamber.

Keywords: 광방출 분석법,O₂ 플라즈마,세정,식각,Optical emission spectroscopy,O₂ plasma,Cleaning,Etch