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Applied Science and Convergence Technology 2011; 20(6): 416-421

Published online November 1, 2011

Copyright © The Korean Vacuum Society.

Optimizing Cleaning Period of Oxide Etcher Using Optical Emission Spectroscopy

Gil Su Son , Yong Han Roh , Geun Young Yeom , Su Hong Kim , Myoung Woon Kim , Hyung Chul Cho


In this paper, the relationship of chamber contamination and the intensity change of specific wavelength was investigated. “diff_CO” formula was introduced to rule out background noise caused by external conditions and to detect when the polymer is removed from the chamber. As RF time increased, diff_CO trend showed the decrease of the maximum peak and increased number of small intensity peaks. From the diff_CO change, it was possible to determine when the chamber needs to be cleaned without opening the chamber.

Keywords: 광방출 분석법,O₂ 플라즈마,세정,식각,Optical emission spectroscopy,O₂ plasma,Cleaning,Etch

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