Chemical Vapor Deposition Using Ethylene Gas toward Low Temperature Growth of Single-Walled Carbon Nanotubes

Sung-Il Jo; Goo-Hwan Jeong

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Research Paper

Applied Science and Convergence Technology 2015; 24(6): 262-267

Published online November 30, 2015

https://doi.org/10.5757/ASCT.2015.24.6.262

Chemical Vapor Deposition Using Ethylene Gas toward Low Temperature Growth of Single-Walled Carbon Nanotubes

Sung-Il Jo and Goo-Hwan Jeong^*

Department of Nano Applied Engineering, Kangwon National University, Chuncheon, Gangwon-do 200-701, Korea

Correspondence to:Goo-Hwan Jeong ghjeong@kangwon.ac.kr

Received: October 23, 2015; Accepted: November 9, 2105

This is an Open Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/by-nc/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.

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Abstract

We demonstrate the growth of single-walled carbon nanotubes (SWNTs) using ethylene-based chemical vapor deposition (CVD) and ferritin-induced catalytic particles toward growth temperature reduction. We first optimized the gas composition of H₂ and C₂H₄ at 500 and 30 sccm, respectively. On a planar SiO₂ substrate, high density SWNTs were grown at a minimum temperature of 760°C. In the case of growth using nanoporous templates, many suspended SWNTs were also observed from the samples grown at 760°C; low values of I_D/I_G in the Raman spectra were also obtained. This means that the temperature of 760°C is sufficient for SWNT growth in ethylene-based CVD and that ethylene is more effective that methane for low temperature growth. Our results provide a recipe for low temperature growth of SWNT; such growth is crucial for SWNT-based applications.

Keywords: Ethylene, Chemical vapor deposition, Single-walled carbon nanotube, Low-temperature growth, Zeolite