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Research Paper

Applied Science and Convergence Technology 2022; 31(2): 46-50

Published online March 30, 2022


Copyright © The Korean Vacuum Society.

Microwave Plasma Source Optimization for Thin Film Deposition Applications

Mahmoud A. I. Elgarhya , b , *

aPhysics Department, Faculty of Science, Al-Azhar University, Cairo, Egypt
bDepartment of Nuclear Engineering, Seoul National University, Seoul 08826, Republic of Korea

Correspondence to:E-mail: elgarhy@azhar.edu.eg, elgarhy@snu.ac.kr

Received: November 25, 2021; Revised: December 31, 2021; Accepted: January 24, 2022

This is an Open Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License(http://creativecommons.org/licenses/by-nc/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.


We designed a magnetic field enhanced microwave large-area plasma source and optimized it for application in thin film deposition. To develop stable and high-density plasma, microwaves were radially injected into the region of an externally applied magnetic field, and plasma parameters were measured using electric and emissive probes. The plasma density and electron temperature at the radial center of the chamber were ~2×1014m?3 and ~5 eV, respectively. The plasma parameters were enhanced by applying an external magnetic field, and the spatial measurements of plasma density and electron temperature indicated that the plasma is stable in the radial central region of the chamber. The plasma potential was measured by different techniques, and a slight difference in the measured potential values was observed.

Keywords: Microwave plasma sources, Electric probe, Emissive probe

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