3-D Numerical Simulation and Optical Diagnosis of Temperature Distribution Inside a Chamber of Hot Filament Chemical Vapor Deposition

Daeun Choi; Yong Hee Lee; Kwang Ho Kim; Sooseok Choi

doi:10.5757/ASCT.2023.32.1.7

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Applied Science and Convergence Technology 2023; 32(1): 7-11

Published online January 30, 2023

https://doi.org/10.5757/ASCT.2023.32.1.7

3-D Numerical Simulation and Optical Diagnosis of Temperature Distribution Inside a Chamber of Hot Filament Chemical Vapor Deposition

Daeun Choi^a , Yong Hee Lee^a , Kwang Ho Kim^b , and Sooseok Choi^{a , ∗}

^aFaculty of Applied Energy System, Jeju National University, Jeju 63243, Republic of Korea
^bSchool of Materials Science and Engineering, Pusan National University, Busan 46241, Republic of Korea

Correspondence to:sooseok@jejunu.ac.kr

Received: October 10, 2022; Revised: November 30, 2022; Accepted: December 8, 2022

This is an Open Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License(http://creativecommons.org/licenses/by-nc/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.

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Abstract

Hot filament chemical vapor deposition (HFCVD) is a well-known process for producing diamond-thin films. The worktable temperature of HFCVD equipment is among the most important requirements for the manufacture of high-quality thin films, but it is difficult to measure that temperature. In this study, worktable temperature was predicted through a three-dimensional numerical simulation considering radiative heat transfer using a commercial computational fluid dynamic code, ANSYS-FLUENT (Ver. 20.1). We also carried out optical diagnosis of temperature of filament surface through two-color pyrometry method. The results showed that difference rates are similar, within 18 %, demonstrating the validity of both filament temperature calculation through thermal fluid analysis and the temperature diagnosis method using two-color pyrometry.

Keywords: Hot filament chemical vapor deposition, Computational fluid dynamic, ANSYS-FLUENT, Numerical simulation