Applied Science and Convergence Technology 2023; 32(1): 7-11
Published online January 30, 2023
Copyright © The Korean Vacuum Society.
Daeun Choia , Yong Hee Leea , Kwang Ho Kimb , and Sooseok Choia , ∗
aFaculty of Applied Energy System, Jeju National University, Jeju 63243, Republic of Korea
bSchool of Materials Science and Engineering, Pusan National University, Busan 46241, Republic of Korea
This is an Open Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License(http://creativecommons.org/licenses/by-nc/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
Hot filament chemical vapor deposition (HFCVD) is a well-known process for producing diamond-thin films. The worktable temperature of HFCVD equipment is among the most important requirements for the manufacture of high-quality thin films, but it is difficult to measure that temperature. In this study, worktable temperature was predicted through a three-dimensional numerical simulation considering radiative heat transfer using a commercial computational fluid dynamic code, ANSYS-FLUENT (Ver. 20.1). We also carried out optical diagnosis of temperature of filament surface through two-color pyrometry method. The results showed that difference rates are similar, within 18 %, demonstrating the validity of both filament temperature calculation through thermal fluid analysis and the temperature diagnosis method using two-color pyrometry.
Keywords: Hot filament chemical vapor deposition, Computational fluid dynamic, ANSYS-FLUENT, Numerical simulation