Applied Science and Convergence Technology 2023; 32(1): 7-11
Published online January 30, 2023
https://doi.org/10.5757/ASCT.2023.32.1.7
Copyright © The Korean Vacuum Society.
Daeun Choia , Yong Hee Leea , Kwang Ho Kimb , and Sooseok Choia , ∗
aFaculty of Applied Energy System, Jeju National University, Jeju 63243, Republic of Korea
bSchool of Materials Science and Engineering, Pusan National University, Busan 46241, Republic of Korea
Correspondence to:sooseok@jejunu.ac.kr
This is an Open Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License(http://creativecommons.org/licenses/by-nc/3.0) which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
Hot filament chemical vapor deposition (HFCVD) is a well-known process for producing diamond-thin films. The worktable temperature of HFCVD equipment is among the most important requirements for the manufacture of high-quality thin films, but it is difficult to measure that temperature. In this study, worktable temperature was predicted through a three-dimensional numerical simulation considering radiative heat transfer using a commercial computational fluid dynamic code, ANSYS-FLUENT (Ver. 20.1). We also carried out optical diagnosis of temperature of filament surface through two-color pyrometry method. The results showed that difference rates are similar, within 18 %, demonstrating the validity of both filament temperature calculation through thermal fluid analysis and the temperature diagnosis method using two-color pyrometry.
Keywords: Hot filament chemical vapor deposition, Computational fluid dynamic, ANSYS-FLUENT, Numerical simulation