Spectroscopic Analysis of Effects of Additive Nitrogen on Atmospheric Pressure Ar/HMDS Plasma

Jonggu Han; Rodolphe Mauchauffé; Se Youn Moon

doi:10.5757/ASCT.2023.32.5.114

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Research Paper

Applied Science and Convergence Technology 2023; 32(5): 114-117

Published online September 30, 2023

https://doi.org/10.5757/ASCT.2023.32.5.114

Spectroscopic Analysis of Effects of Additive Nitrogen on Atmospheric Pressure Ar/HMDS Plasma

Jonggu Han^a , Rodolphe Mauchauffé^b , and Se Youn Moon^{a , c , d , *}

^aDepartment of Applied Plasma and Quantum Beam Engineering, Jeonbuk National University, Jeonju 54896, Republic of Korea
^bMaterials Research and Technology Department, Luxembourg Institute of Science and Technology, Esch-sur-Alzette L-4362, Luxembourg
^cDepartment of Quantum System Engineering, Jeonbuk National University, Jeonju 54896, Republic of Korea
^dHigh-Enthalpy Plasma Research Center, Jeonbuk National University, Wanju 55317, Republic of Korea

Correspondence to:symoon@jbnu.ac.kr

Received: June 12, 2023; Revised: August 16, 2023; Accepted: August 25, 2023

This is an Open Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (https://creativecommons.org/licenses/by-nc-nd/4.0/) which permits non-commercial use, distribution and reproduction in any medium without alteration, provided that the original work is properly cited.

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Abstract

Hexamethyldisilazane (HMDS) is a cost-effective and stable compound used to synthesize thin films for applications such as silicon nitride thin-film deposition. Plasma-enhanced chemical vapor deposition is commonly used to deposit thin films from HMDS because plasma offers sufficient energy to effectively decompose HMDS and facilitates the formation of films. Various gases are added to the plasma to modulate its characteristics. This study investigated the effect of N₂ addition to atmospheric-pressure Ar/HMDS plasma. Optical emission spectroscopy measurements provided valuable insights into the characteristics of the plasma under different N₂ gas flow rates, and the importance of N₂ as a deposition parameter was discussed. The introduction of N₂ in the Ar/HMDS plasma decreased the excitation, vibrational, and rotational temperatures, significantly changing the composition of reactive species in the plasma.

Keywords: Hexamethyldisilazane, Plasma enhanced chemical vapor deposition, Nitrogen plasma, Synthetic spectra, Optical emission spectroscopy