Applied Science and Convergence Technology 2023; 32(5): 114-117
Published online September 30, 2023
Copyright © The Korean Vacuum Society.
aDepartment of Applied Plasma and Quantum Beam Engineering, Jeonbuk National University, Jeonju 54896, Republic of Korea
bMaterials Research and Technology Department, Luxembourg Institute of Science and Technology, Esch-sur-Alzette L-4362, Luxembourg
cDepartment of Quantum System Engineering, Jeonbuk National University, Jeonju 54896, Republic of Korea
dHigh-Enthalpy Plasma Research Center, Jeonbuk National University, Wanju 55317, Republic of Korea
This is an Open Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (https://creativecommons.org/licenses/by-nc-nd/4.0/) which permits non-commercial use, distribution and reproduction in any medium without alteration, provided that the original work is properly cited.
Hexamethyldisilazane (HMDS) is a cost-effective and stable compound used to synthesize thin films for applications such as silicon nitride thin-film deposition. Plasma-enhanced chemical vapor deposition is commonly used to deposit thin films from HMDS because plasma offers sufficient energy to effectively decompose HMDS and facilitates the formation of films. Various gases are added to the plasma to modulate its characteristics. This study investigated the effect of N2 addition to atmospheric-pressure Ar/HMDS plasma. Optical emission spectroscopy measurements provided valuable insights into the characteristics of the plasma under different N2 gas flow rates, and the importance of N2 as a deposition parameter was discussed. The introduction of N2 in the Ar/HMDS plasma decreased the excitation, vibrational, and rotational temperatures, significantly changing the composition of reactive species in the plasma.
Keywords: Hexamethyldisilazane, Plasma enhanced chemical vapor deposition, Nitrogen plasma, Synthetic spectra, Optical emission spectroscopy