Applied Science and Convergence Technology 2024; 33(6): 164-166
Published online November 30, 2024
https://doi.org/10.5757/ASCT.2024.33.6.164
Copyright © The Korean Vacuum Society.
Department of Physics, Changwon National University, Changwon 51139, Republic of Korea
Correspondence to:jongtae@changwon.ac.kr
This is an Open Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (https://creativecommons.org/licenses/by-nc-nd/4.0/) which permits non-commercial use, distribution and reproduction in any medium without alteration, provided that the original work is properly cited.
Near-infrared (NIR) photodetection is required for modern imaging applications such as digital cameras, environmental monitoring, and medical diagnostics. Silicon-based photodiodes can detect light with a wavelength of up to 1,000 nm while InGaAs-based photodiodes that can detect NIR light are expensive to fabricate. Two-dimensional semiconductors have shown excellent electrical and optical properties. Showing high absorption coefficients and high carrier mobility, they are attracting attention as future optoelectronic devices. MoTe2 has an energy band gap of 0.9 eV in a few-layer configuration and can absorb wavelength of 1,300 nm, and thus has high potential as a photodetector in the NIR region. SnSe2 meanwhile has very high conductivity and excellent electrical properties. In this study, we fabricated a MoTe2/SnSe2 heterojunction photodiode and reported its electrical and optical properties. In addition, we extracted the potential barrier of the MoTe2/SnSe2 heterojunction from the temperature dependent I−V curve.
Keywords: Two-dimensional materials, MoTe2, SnSe2, Near-infrared photodetection, Photodiode
Two-dimensional (2D) semiconductor materials recently have attracted considerable attention as future semiconductor devices due to their unique and outstanding physical properties [1–4]. Each layer interacts with weak van der Waals force and thus can be easily peeled off with mechanical exfoliation using Scotch tape [5]. Due to the thinness of 2D semiconductors, they exhibit interesting physical properties such as a layer dependent band gap, valley related transport induced by broken inversion symmetry, and giant magnetoresistance. 2D semiconductor materials have high carrier mobility due to their single crystalline structure and have no dangling bonds on the surface, and consequently are advantageous for high integration and hold promise as high-performance electronic devices [6–14]. In addition, owing to excellent interaction with light and the ease of forming heterojunctions, they have significant potential for use as next-generation optoelectronic devices. Representative 2D semiconductor materials include graphene, transition metal chalcogenides (TMDCs), black phosphorus, and Mxene [5,7,15,16]. 2D TMDCs with energy bandgaps in nearinfrared (NIR) regions are attracting attention as candidate materials for NIR photodetection [9,12,17–19].
Here, we fabricated a MoTe2/SnSe2 heterostructure photodiode for NIR photodetection. MoTe2 has a smaller band gap than other TMDCs such as MoS2 and WSe2. The band gap of monolayer MoTe2 is ~1.1 eV, which is similar to that of silicon. Few layer MoTe2 meanwhile has a band gap of 0.95 eV, enabling NIR photodetection. SnSe2 has excellent electrical conductivity and strongly n-doped characteristics. To characterize MoTe2 and SnSe2, we fabricated a MoTe2 field effect transistor (FET) and a SnSe2 FET. The MoTe2 FET shows typical p-type characteristics in the transfer curve with a high on/off ratio and mobility of ~43 cm2/Vs. The SnSe2 FET shows strong n-type characteristics in the transfer curve with a low on/off ratio and mobility of ~3.77 cm2/Vs. The fabricated MoTe2/SnSe2 heterojunction diode exhibits a high rectification ratio of 104, an ideality factor of 1.5, and a clear photoresponse under light emitting diode (LED) illumination from 528 to 1,300 nm. The short-circuit current (ISC) is up to ~400 pA and the open circuit voltage (VOC) is ~0.1 V. This photoresponse is due to the band alignment of MoTe2 and SnSe2. From temperature dependent I−V characteristics, the potential barrier height was extracted as 0.54 eV and this value appears to be reasonable, as demonstrated by the band alignment.
The 2D MoTe2/SnSe2 photodiode was fabricated on a glass substrate (Eagle XG). First, 2D MoTe2 nanoflakes were mechanically exfoliated using a polydimethylsiloxane (PDMS) stamp and then transferred onto a glass substrate using a direct imprint system. Subsequently, SnSe2 nanoflakes were exfoliated in the same manner and then transferred to partially overlap the MoTe2 flakes. Patterned Ti (25 nm)/Au (25 nm) electrodes were deposited on SnSe2 nanoflakes by direct current magnetron sputtering and conventional photolithography lift-off processes. A Pt (50 nm) electrode was also deposited on MoTe2 in the same manner as applied for the Ti electrode. Finally, the device was annealed at 200 °C for 5 min under ambient conditions.
Figures 1(a) and 1(b) show an optical microscope (OM) image and a three-dimentional (3D) schematic of the p-MoTe2/n-SnSe2 heterojunction photodiode. MoTe2 and SnSe2 formed a vertical heterojunction via PDMS dry transfer onto the glass substrate. Ti/Au was used for the SnSe2 contact electrode. Pt/MoTe2 shows good ohmic contact characteristics. The junction area is estimated to be 30 μm2. Figure 2(a) shows a 3D schematic of the n-SnSe2 FET. The SnSe2 FET with a Ti/Au electrode shows highly doped n-type characteristics, as presented in Fig. 2(b). The on/off ratio is only 1.5 under ± 50 V of gate voltage [inset Fig. 2(b)]. The electron mobility is calculated as ~3.77 cm2/Vs with the following Eq. (1).
where ID is the drain current, VGS is the gate voltage, VDS is the drain voltage, L is the length of the FET, W is the width of the FET, and COX is the oxide capacitance. We used the linear mobility equation due to the low drain voltage of 0.1 V. SiO2 with 285 nm thickness was used for the gate oxide and COX is calculated as 1.211 × 10−8 F/cm. Figure 2(c) exhibits a 3D schematic of the p-MoTe2 FET with a Pt electrode. Unlike the SnSe2 FET, the MoTe2 FET shows a high on/off ratio of ~105. Figure 2(d) shows that the MoTe2 FET has a high on-current of about 10−6 A and a low off-current of about 10−11 A under ± 50 V of VGS. The hole mobility is calculated as 43 cm2/Vs. Figure 3(a) shows the current–voltage (I−V) characteristics of the MoTe2/SnSe2 heterojunction diode under a dark state. This heterojunction diode showed typical PN junction diode behavior without any additional field effect, operating effectively at a low voltage of ±2 V. The ideal factor of the diode was estimated to be approximately η~1.5, extracted using the equation
I−V curves were measured at various temperatures to determine the potential barrier of the MoTe2/SnSe2 heterojunction diode. Figure 4(a) shows the temperature dependent I−V curves from 180 to 270 K. As expected, the current decreases as the temperature decreases due to the reduced carrier concentration and decreased thermal energy to overcome the barrier. As seen in Fig. 4(b), the activation energy for thermionic emission was extracted from the slope of the reverse current versus a q/kBT plot based on the temperature-dependent I−V curves. The activation energy is approximately 0.55 eV, this value that is related to the band alignment of MoTe2 and SnSe2. Figure 4(c) illustrates the band alignment of MoTe2 and SnSe2. SnSe2 has a large electron affinity of 5 eV and an ionization energy of 6.2 eV, whereas MoTe2 has an electron affinity of 4.22 eV and an ionization energy of 5.1 eV. The theoretical potential barrier for electron transfer is approximately 0.78 eV, which aligns closely with the experimental value.
This work demonstrates a MoTe2/SnSe2 heterojunction photodiode for broadband photodetection. The device exhibits a high rectification ratio over 105, with low leakage current and high on current. We determined a significant activation energy of approximately 0.55 eV, which closely aligns with the theoretical potential barrier of 0.78 eV based on band alignment, indicating a well-matched heterojunction interface. The photodiode shows a broad spectral response (528 to 1,300 nm) with peak responsivity at 630 nm and PV behavior was observed, indicating its suitability for low-power, high-sensitivity optoelectronics as well as its potential for next-generation photodetectors and solar cells.
This research was supported by Changwon National University in 2023−2024.
The authors declare no conflicts of interest.